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Yongqiang Pan, Huan Liu, Zhuoman Wang, Jinmei Jia and Jijie Zhao
SiO2 thin films are deposited by radio frequency (RF) plasma-enhanced chemical vapor deposition (PECVD) technique using SiH4 and N2O as precursor gases. The stoichiometry of SiO2 thin films is determined by the X-ray photoelectron spectroscopy (XPS), and...
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Chun Guo and Mingdong Kong
Optical and mechanical properties of multilayer coatings depend on the selected layer materials and the deposition technology; therefore, knowledge of the performances of thin films is essential. In the present work, titanium dioxide (TiO2) and silicon d...
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Jin-Cherng Hsu, Heng-Ying Cho, Tsang-Yen Hsieh and Jyh-Liang Wang
An ultra-low anti-reflection optical coating on both surfaces of a plastic cover slip was studied for use in confocal image measurements. The optical reflectance at a wavelength of 632.8 nm was less than 0.1% when the coated sample was placed in a liquid...
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Hiroshi Okabe, Masayuki Hayakawa, Junichi Matoba, Hitoshi Naito, and Kazuhiko Oka
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Takashi Imazono, Kazuo Sano, Yoji Suzuki, Tetsuya Kawachi, and Masato Koike
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T. McMillan, P. Taborek, and J. E. Rutledge
Pág. 5005 - 5009
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Topcu, S. Chassagne, L. Alayli, Y.
Pág. 4442 - 4447
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Park, Sunglim; Jung, Jaewha; Gweon, DaeGab; Kim, Young Dong
Pág. 2988 - 2993
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Richter, Andrew; Guico, Rodney; Wang, Jin
Pág. 3004 - 3007
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Zapien, J. A.; Collins, R. W.; Messier, R.
Pág. 3451 - 3460
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