REVISTA

ChemEngineering

ISSN: 2305-7084   Frecuencia: 4   Formato: Electrónica

Tablas de contenido  

23 artículos asociados

Volumen 4 Número 0 Parte 2 Año 2020

Hamza Dunya, Maziar Ashuri, Dana Alramahi, Zheng Yue, Kamil Kucuk, Carlo U. Segre and Braja K. Mandal
 

Subhashis Das, Rajnish Kaur Calay and Ranjana Chowdhury
 

Toni Kauppinen, Tuomas Vielma, Justin Salminen and Ulla Lassi
 

Rodrigue Djeda, Gilles Mailhot and Vanessa Prevot
 

Gamze S. Bas and Erol Sancaktar
 

Mukesh Upadhyay, Ayeon Kim, Heehyang Kim, Dongjun Lim and Hankwon Lim
 

Ravin S. Sahota and Sam M. Dakka
 

John J. Fitzpatrick, Shaozong Wu, Kevin Cronin and Song Miao
 

John J. Fitzpatrick, Franck Gloanec and Elisa Michel
 

Thomas Grützner
 

Amal Narayanan, Ying Xu, Ali Dhinojwala and Abraham Joy
 

Marc Scherle and Ulrich Nieken
 

Iwan H. Sahputra, Alessio Alexiadis and Michael J. Adams
 

Sumudu S. Karunarathne, Khim Chhantyal, Dag A. Eimer and Lars E. Øi
 

Nachiket Arbad and Catalin Teodoriu
 

Marcel Loewert, Michael Riedinger and Peter Pfeifer
 

Darunee Aussawasathien and Erol Sancaktar
 

Santiago Barreiro-Vescovo, Elena Barbera, Alberto Bertucco and Eleonora Sforza
 

Vincenzo Russo, Luca Mastroianni, Riccardo Tesser, Tapio Salmi and Martino Di Serio
 

Son Ich Ngo and Young-Il Lim
 

Navid Khordehgah, Alina Zabnienska-Góra and Hussam Jouhara
 

Marcel Loewert and Peter Pfeifer
 

Mark P. Heitz, Zackary C. Putney and Joel Campaign