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Maxim Sergeevich Vorobyov, Elizaveta Alekseevna Petrikova, Vladislav Igorevich Shin, Pavel Vladimirovich Moskvin, Yurii Fedorovich Ivanov, Nikolay Nikolaevich Koval, Tamara Vasil`evna Koval, Nikita Andreevich Prokopenko, Ruslan Aleksandrovich Kartavtsov and Dmitry Alekseevich Shpanov
A niobium film on an AISI 5135 steel substrate was exposed to submillisecond pulsed electron-beam irradiation with controlled energy modulation within a pulse to increase the film?substrate adhesion. This modulated irradiation made it possible to dope th...
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Sergey Grigoriev, Alexander Metel, Marina Volosova and Yury Melnik
A new hollow cathode sputtering system is used for beam-assisted deposition of thin films on dielectric substrates. A copper target placed at the hollow cathode bottom is uniformly sputtered by argon ions from the glow discharge plasma filling the cathod...
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X. M. Zhang, X. B. Tian, S. Q. Yang, C. Z. Gong, R. K. Y. Fu, and P. K. Chu
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