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Lubo? Podlucký, Andrej Vincze, Sona Kovácová, Juraj Chlpík, Jaroslav Kovác and Franti?ek Uherek
In this paper, the analysis of silicon oxynitride (SiON) films, deposited utilizing the plasma enhanced chemical vapor deposition (PECVD) process, for optical waveguides on silicon wafers is presented. The impact of N2O flow rate on various SiON film pro...
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