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Richard Krumpolec, Tomá? Homola, David C. Cameron, Josef Humlícek, Ondrej Caha, Karla Kuldová, Raul Zazpe, Jan Prikryl and Jan M. Macak
Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were depos...
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