2   Artículos

 
en línea
Samiran Bairagi, Kenneth Järrendahl, Fredrik Eriksson, Lars Hultman, Jens Birch and Ching-Lien Hsiao    
Glancing angle deposition (GLAD) of AlN nanostructures was performed at room temperature by reactive magnetron sputtering in a mixed gas atmosphere of Ar and N2. The growth behavior of nanostructures shows strong dependence on the total working pressure ... ver más
Revista: Coatings    Formato: Electrónico

 
en línea
Elena Alexandra Serban, Aditya Prabaswara, Justinas Palisaitis, Per Ola Åke Persson, Lars Hultman, Jens Birch and Ching-Lien Hsiao    
Selective-area grown, catalyst-free GaN nanorod (NR) arrays grown on Si substrates have been realized using liquid-target reactive magnetron sputter epitaxy (MSE). Focused ion beam lithography (FIBL) was applied to pattern Si substrates with TiNx masks. ... ver más
Revista: Coatings    Formato: Electrónico

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