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Christian Dussarrat, Nicolas Blasco, Wontae Noh, Jooho Lee, Jamie Greer, Takashi Teramoto, Sunao Kamimura, Nicolas Gosset and Takashi Ono    
The thermal atomic layer deposition (ThALD) of yttrium oxide (Y2O3) was developed using the newly designed, liquid precursor, Y(EtCp)2(iPr2-amd), as the yttrium source in combination with different oxygen sources, such as ozone, water and even molecular ... ver más
Revista: Coatings    Formato: Electrónico

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