2   Artículos

 
en línea
Minyu Bai, Shuai Wen, Jijie Zhao, Yuxuan Du, Fei Xie and Huan Liu    
The carrier gas flow field plays a vital role in the chemical vapor deposition (CVD) process of two dimensional (2D) MoS2 crystal, which was studied by simulations and experiments. Different carrier gas flow fields were studied by utilizing three types o... ver más
Revista: Coatings    Formato: Electrónico

 
en línea
Yongqiang Pan, Huan Liu, Zhuoman Wang, Jinmei Jia and Jijie Zhao    
SiO2 thin films are deposited by radio frequency (RF) plasma-enhanced chemical vapor deposition (PECVD) technique using SiH4 and N2O as precursor gases. The stoichiometry of SiO2 thin films is determined by the X-ray photoelectron spectroscopy (XPS), and... ver más
Revista: Coatings    Formato: Electrónico

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