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Chiara Carra, Elisa Dell?Orto, Vittorio Morandi and Claudia Riccardi
Zinc Oxide nanostructured thin films were grown by a novel plasma assisted vapour deposition method, which aims to combine the versatility of deposition processes that are mediated by plasma with the capability to control particles diffusion and nucleati...
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Ben Wang, Xiuhua Fu, Shigeng Song, Hin On Chu, Desmond Gibson, Cheng Li, Yongjing Shi and Zhentao Wu
Optimization of thin film uniformity is an important aspect for large-area coatings, particularly for optical coatings where error tolerances can be of the order of nanometers. Physical vapor deposition is a widely used technique for producing thin films...
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Musab Timan Idriss Gasab, Hiroyuki Sugawara, Takemi Sato and Hiroshi Fujiyama
The double-ended coaxial magnetron pulsed plasma (DCMPP) method with auxiliary outer anode was introduced in order to achieve the uniform coating of non-conductive thin films on the inner walls of insulator tubes. In this study, titanium (Ti) was employe...
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Minghao Wang, Ziyu Wang, Deyu Li and Ning Li
Topography observation of the nanoscale passivation film on tinplate using a scanning electron microscope and an electro-optical surface profilometer showed that it was difficult to observe the true topography because of the high surface roughness of the...
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Miia Mäntymäki, Mikko Ritala and Markku Leskelä
Lithium-ion batteries are the enabling technology for a variety of modern day devices, including cell phones, laptops and electric vehicles. To answer the energy and voltage demands of future applications, further materials engineering of the battery com...
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Huan Liu, Xudong Fang, Le Meng and Shanshan Wang
Spin coating is one of the dominant processes for producing photoresistant thin films in integrated circuit manufacturing. The application of this process mainly focuses on flat surfaces. With the development of science and technology, the spin coating p...
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Chih-Kai Hu, Chun-Jung Chen, Ta-Chin Wei, Tomi T. Li, Chih-Yung Huang, Chu-Li Chao and Yi-Jiun Lin
A numerical verification procedure and the effects of operating conditions in a large, vertical, and close-spaced reactor for metalorganic chemical vapor deposition are investigated through simulation and analysis. A set of epitaxy experiments are presen...
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