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Guanglu Zhang, Jindong Huang, Luoshu Wang, Zhenbo Geng, Dequan Zhang and Juncheng Liu
Space solar cell glass covers require high radiation resistance and wide-spectrum high light transmittance. The existing research on the preparation of thin films or special optical structures on the surface of solar cells rarely involves systematic rese...
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Christian Dussarrat, Nicolas Blasco, Wontae Noh, Jooho Lee, Jamie Greer, Takashi Teramoto, Sunao Kamimura, Nicolas Gosset and Takashi Ono
The thermal atomic layer deposition (ThALD) of yttrium oxide (Y2O3) was developed using the newly designed, liquid precursor, Y(EtCp)2(iPr2-amd), as the yttrium source in combination with different oxygen sources, such as ozone, water and even molecular ...
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David Vokoun, Ladislav Klim?a, Aliaksei Vetushka, Jan Duchon, Jan Racek, Jan Drahokoupil, Jaromír Kopecek, Yo-Shane Yu, Narmatha Koothan and Chi-Chung Kei
Pt coatings on NiTi film micro-actuators and/or sensors can add some useful properties, e.g., they may improve the NiTi anticorrosion and thermomechanical characteristics or activate surface properties beneficial for a specific application (e.g., functio...
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Jeongwoo Park, Neung Kyung Yu, Donghak Jang, Eunae Jung, Hyunsik Noh, Jiwon Moon, Deoksin Kil and Bonggeun Shong
Various processes based on atomic layer deposition (ALD) have been reported for growing Ti-based thin films such as TiN and TiO2. To improve the uniformity and conformity of thin films grown via ALD, fundamental understanding of the precursor?substrate s...
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Chao Zhao and Jinjuan Xiang
Metal gate of CMOS devices.
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Miia Mäntymäki, Mikko Ritala and Markku Leskelä
Lithium-ion batteries are the enabling technology for a variety of modern day devices, including cell phones, laptops and electric vehicles. To answer the energy and voltage demands of future applications, further materials engineering of the battery com...
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Richard Krumpolec, Tomá? Homola, David C. Cameron, Josef Humlícek, Ondrej Caha, Karla Kuldová, Raul Zazpe, Jan Prikryl and Jan M. Macak
Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were depos...
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Tatiana V. Ivanova, Tomá? Homola, Anton Bryukvin and David C. Cameron
The catalytic behaviour of Ag2O and Ag doped CeO2 thin films, deposited by atomic layer deposition (ALD), was investigated for diesel soot oxidation. The silver oxide was deposited from pulses of the organometallic precursor (hfac)Ag(PMe3) and ozone at 2...
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Robert Müller, Lilit Ghazaryan, Paul Schenk, Sabrina Wolleb, Vivek Beladiya, Felix Otto, Norbert Kaiser, Andreas Tünnermann, Torsten Fritz and Adriana Szeghalmi
High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)ruthenium) and oxygen by thermal atomic layer deposition (ALD) and compared to magnetron sputtered (MS) Ru coatings. The ALD Ru film growth and surface rough...
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Luis Javier Fernández-Menéndez, Ana Silvia González, Víctor Vega and Víctor Manuel De la Prida
In this work, the entire manufacturing process of electrostatic supercapacitors using the atomic layer deposition (ALD) technique combined with the employment of nanoporous anodic alumina templates as starting substrates is reported. The structure of a u...
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