|
|
|
|
|
Yongqiang Pan, Huan Liu, Zhuoman Wang, Jinmei Jia and Jijie Zhao
SiO2 thin films are deposited by radio frequency (RF) plasma-enhanced chemical vapor deposition (PECVD) technique using SiH4 and N2O as precursor gases. The stoichiometry of SiO2 thin films is determined by the X-ray photoelectron spectroscopy (XPS), and...
ver más
|
|
|
|
|
|
|
|
|
|
|
Hieronim Szymanowski, Katarzyna Olesko, Jacek Kowalski, Mateusz Fijalkowski, Maciej Gazicki-Lipman and Anna Sobczyk-Guzenda
In this work, optical coatings with a gradient of the refractive index are described. Its aim was to deposit, using the RF PECVD method, films of variable composition (ranging from silicon carbon-oxide to silicon carbon-nitride) for a smooth change of th...
ver más
|
|
|
|
|
|
|
|
|
|
|
Imane Bouabibsa, Salim Lamri and Frederic Sanchette
Metal containing hydrogenated diamond-like carbon coatings (Me-DLC, Me = Al, Ti, or Nb) of 3 ± 0.2 μm thickness were deposited by a magnetron sputtering-RFPECVD hybrid process in an Ar/H2/C2H2 mixture. The composition and structure were investi...
ver más
|
|
|
|
|
|