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Chih-Kai Hu, Chun-Jung Chen, Ta-Chin Wei, Tomi T. Li, Chih-Yung Huang, Chu-Li Chao and Yi-Jiun Lin
A numerical verification procedure and the effects of operating conditions in a large, vertical, and close-spaced reactor for metalorganic chemical vapor deposition are investigated through simulation and analysis. A set of epitaxy experiments are presen...
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Mohammad Afzaal, Heather M. Yates and John L. Hodgkinson
In this work, the impact of translation rates in fluorine doped tin oxide (FTO) thin films using atmospheric pressure chemical vapour deposition (APCVD) were studied. We demonstrated that by adjusting the translation speeds of the susceptor, the growth r...
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Yu. L. Bolshakov,Y. S. Hershman,V. H. Sychenko,S. M. Zhukovin
Pág. 14 - 20
Basic directions of creation of new composition materials for the insertions of current receiver electric transport are considered in the article.
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