|
|
|
Alexey O. Volkhonsky, Igor V. Blinkov and Dmitry S. Belov
The influence of the compressive and tensile stresses forming in the nanostructured Ti?Al?N coatings during deposition on their physical-mechanical properties was studied. The modifying influence of metal components (Ni and Cu) introduction into Ti?Al?N ...
ver más
|
|
|
|
|
|
|
Bogdan Warcholinski, Adam Gilewicz, Piotr Myslinski, Ewa Dobruchowska and Dawid Murzynski
Al?Cr?N coatings were formed at various nitrogen pressures, substrate bias voltages and substrate temperatures using cathodic arc evaporation. The relationship between technological parameters and properties of the coatings was investigated. The phase an...
ver más
|
|
|
|
|
|
|
Sergei Zenkin, Fedor Konusov, Aleksandr Lauk, Denis Zelentsov and Stanislav Demchenko
This article reports on the influence of the sputtering parameters (discharge voltage, average target power density) of a high power impulse magnetron discharge (HiPIMS) on the structure, mechanical and optical properties of silicon-rich Al–Si&ndas...
ver más
|
|
|
|
|
|
|
Ph. V. Kiryukhantsev-Korneev, Zh. S. Amankeldina, A. N. Sheveyko, S. Vorotilo and E. A. Levashov
Boron and oxygen-doped Cr?Al?Ti?N coatings were deposited by closed field unbalanced magnetron sputtering (CFUBMS) of TiB target manufactured by self-propagating high-temperature synthesis, and Ti, Cr, and Al targets. To evaluate the influence of doping ...
ver más
|
|
|
|
|
|
|
Alexey Vereschaka, Sergey Grigoriev, Nikolay Sitnikov, Anatoliy Aksenenko, Filipp Milovich, Nikolay Andreev, Gaik Oganyan and Jury Bublikov
|
|
|
|
|
|
|
Jicheng Ding, Tengfei Zhang, Je Moon Yun, Myung Chang Kang, Qimin Wang and Kwang Ho Kim
CrN and Cr-Al-Si-N coatings were deposited on SUS304 and Si-wafers by a hybrid coating system. The Cr and Al-Si target were connected to the cathode arc ion plating (AIP) and high power impulse magnetron sputtering (HiPIMS), respectively. Various Al and ...
ver más
|
|
|
|
|
|
|
Jun Zheng, Hui Zhou, Binhua Gui, Quanshun Luo, Haixu Li and Qimin Wang
In this study, AlCrN coatings were deposited using modulated pulsed power magnetron sputtering (MPPMS) with different power pulse parameters by varying modulated pulsed power (MPP) charge voltages (350 to 550 V). The influence of power pulse parameters o...
ver más
|
|
|
|
|
|
|
A. Al-Aboodi, N. Merah, A. R. Shuaib, Y. Al-Nassar, and S. S. Al-Anizi
|
|
|
|
|
|
|
El-Keblawy, A.; Al-Shamsi, N.
Pág. 679 - 688
|
|
|
|
|
|
|
Khan, U. A.; Al-Moayed, N.; Nguyen, N.; Korolev, K. A.; Afsar, M. N.; Naber, S. P.
Pág. 2887 - 2893
|
|
|
|