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May Zin Toe, Wai Kian Tan, Hiroyuki Muto, Go Kawamura, Atsunori Matsuda and Swee-Yong Pung
As compared to other deposition techniques such as atomic layer deposition, chemical vapour deposition and sputtering, aerosol deposition (AD) is a simple and cost-effective technique to produce ZnO thin films. In this work, the effect of deposition cycl...
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Mariuca Gartner, Mihai Anastasescu, Hermine Stroescu, Jose Maria Calderon-Moreno, Silviu Preda, Octavian-Gabriel Simionescu, Andrei Avram and Octavian Buiu
Nanocrystalline graphite (NCG) layers represent a good alternative to graphene for the development of various applications, using large area, complementary metal-oxide semiconductor (CMOS) compatible technologies. A comprehensive analysis of the physical...
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Andrew J. Clayton, Ali Abbas, Peter J. Siderfin, Stephen Jones, Ana Teloeken, Ochai Oklobia, John M. Walls and Stuart J. C. Irvine
CdTe solar cells were produced using metal organic chemical vapour deposition (MOCVD), which employed a (Zn,Al)S (AZS) high resistant transparent (HRT) layer at the transparent conducting oxide (TCO)/Cd(Zn)S emitter interface, to enable the higher anneal...
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Arutiun Ehiasarian, Yashodhan Purandare, Arunprabhu Sugumaran, Papken Hovsepian, Peter Hatto and Jeroen De Backer
The Stationary Shoulder Friction Stir Welding (SS-FSW) technique benefits from reduced heat input, improved mechanical properties and surface finish of the weld, avoiding the need for post weld processing. Coatings on the tool probe and the shoulder for ...
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Vitali Podgursky, Asad Alamgir, Maxim Yashin, Taivo Jõgiaas, Mart Viljus, Taavi Raadik, Mati Danilson, Fjodor Sergejev, Andreas Lümkemann, Jan Kluson, Jozef Sondor and Andrei Bogatov
The study investigates thermal stability and high temperature tribological performance of a-C:H:Si diamond-like carbon (DLC) coating. A thin alumina layer was deposited on top of the a-C:H:Si coating to improve the tribological performance at high temper...
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Chiara Carra, Elisa Dell?Orto, Vittorio Morandi and Claudia Riccardi
Zinc Oxide nanostructured thin films were grown by a novel plasma assisted vapour deposition method, which aims to combine the versatility of deposition processes that are mediated by plasma with the capability to control particles diffusion and nucleati...
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Christian Micallef, Yuri Zhuk and Adrianus Indrat Aria
Owing to their high hardness, fracture toughness and oxidation resistance, tungsten carbide (WC) coatings are extensively deposited on parts that operate in demanding applications, necessitating wear, erosion, and corrosion resistance. The application of...
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Qixiang Fan, Haojun Yu, Tiegang Wang and Yanmei Liu
A Si doped Pt modified aluminide coating was prepared by electroplating and the chemical vapour deposition method. The microstructure and oxidation resistance of the coating were studied, with a single Pt modified aluminide coating as a reference. The re...
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Richard Krumpolec, Tomá? Homola, David C. Cameron, Josef Humlícek, Ondrej Caha, Karla Kuldová, Raul Zazpe, Jan Prikryl and Jan M. Macak
Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were depos...
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Andresa Baptista, Francisco Silva, Jacobo Porteiro, José Míguez and Gustavo Pinto
Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, wit...
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