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Tomasz L. Brzezinka, Jeff Rao, Mohamad Chowdhury, Joern Kohlscheen, German S. Fox Rabinovich, Stephen C. Veldhuis and Jose L. Endrino
Combinatorial deposition, comprising filtered cathodic vacuum arc (FCVA) and physical vapor deposition (PVD) magnetron sputtering is employed to deposit molybdenum disulphide (MoS2) and titanium (Ti) thin films onto TiB2-coated tool inserts specifically ...
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