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Ph. V. Kiryukhantsev-Korneev, Zh. S. Amankeldina, A. N. Sheveyko, S. Vorotilo and E. A. Levashov
Boron and oxygen-doped Cr?Al?Ti?N coatings were deposited by closed field unbalanced magnetron sputtering (CFUBMS) of TiB target manufactured by self-propagating high-temperature synthesis, and Ti, Cr, and Al targets. To evaluate the influence of doping ...
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Jinjue Liang, Shimin Chen, Changwei Zou, Canxin Tian, Zesong Wang and Shijun Liao
Cr?Si?O?N coatings with different oxygen contents were deposited by multi-arc ion plating, where various O2/(N2 + O2) reactive gas rates were adopted. The XRD and XPS results showed that the CrN crystals disappeared with the increasing of the oxygen flux...
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Mihaela Dinu, Emile S. Massima Mouele, Anca C. Parau, Alina Vladescu, Leslie F. Petrik and Mariana Braic
Chromium nitride and oxynitride coatings were deposited as monolayers ((Cr?N), Cr(N,O)) and bilayers (Cr?N/Cr(N,O), Cr(N,O)/Cr?N) on 304 steel substrates by reactive cathodic arc method. The coatings were characterised by X-ray diffraction (XRD), scannin...
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Lihua Yu, Huang Luo, Jianguo Bian, Hongbo Ju and Junhua Xu
In this study, the Cr-Ti-B-N composite thin films with different Ti and B contents in the films were fabricated by a reactive magnetron sputtering system using chromium (Cr) and TiB2 targets. The microstructure, mechanical properties, and friction proper...
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Jicheng Ding, Tengfei Zhang, Je Moon Yun, Myung Chang Kang, Qimin Wang and Kwang Ho Kim
CrN and Cr-Al-Si-N coatings were deposited on SUS304 and Si-wafers by a hybrid coating system. The Cr and Al-Si target were connected to the cathode arc ion plating (AIP) and high power impulse magnetron sputtering (HiPIMS), respectively. Various Al and ...
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