An ultrahigh vacuum complementary metal oxide silicon compatible nonlithographic system to fabricate nanoparticle-based devices

Artículos similares

An ultrahigh-vacuum apparatus for resonant diffraction experiments using soft x rays (h=300¿2000 eV)

Acceso

T. Takeuchi, A. Chainani, Y. Takata, Y. Tanaka, M. Oura, M. Tsubota, Y. Senba, H. Ohashi, T. Mochiku, K. Hirata, and S. Shin

Revista: REVIEW OF SCIENTIFIC INSTRUMENTS

Surface photovoltage spectroscopy in a Kelvin probe force microscope under ultrahigh vacuum

Acceso

F. Streicher, S. Sadewasser, and M. Ch. Lux-Steiner

Revista: REVIEW OF SCIENTIFIC INSTRUMENTS

A low-temperature high resolution scanning tunneling microscope with a three-dimensional magnetic vector field operating in ultrahigh vacuum

Acceso

T. Mashoff, M. Pratzer, and M. Morgenstern

Revista: REVIEW OF SCIENTIFIC INSTRUMENTS

Improvement of a dynamic scanning force microscope for highest resolution imaging in ultrahigh vacuum

Acceso

S. Torbrügge, J. Lübbe, L. Tröger, M. Cranney, T. Eguchi, Y. Hasegawa, and M. Reichling

Revista: REVIEW OF SCIENTIFIC INSTRUMENTS

Integrated setup for the fabrication and measurement of magnetoresistive nanoconstrictions in ultrahigh vacuum

Acceso

Daniel Stickler, Robert Frömter, Wei Li, André Kobs, and Hans Peter Oepen

Revista: REVIEW OF SCIENTIFIC INSTRUMENTS