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Inicio  /  Coatings  /  Vol: 8 Núm: 11 Par: Novembe (2018)  /  Artículo
ARTÍCULO
TITULO

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

Artur Wiatrowski    
Michal Mazur    
Agata Obstarczyk    
Damian Wojcieszak    
Danuta Kaczmarek    
Jerzy Morgiel and Des Gibson    

Resumen

In this paper, a comparison of TiO2 thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin films deposited with a gas impulse had a nanocrystalline rutile structure instead of fibrous-like anatase obtained with a continuous gas flow. TiO2 thin films deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO2 thin films.

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Revista: Applied Sciences