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ARTÍCULO
TITULO

The Influence of Oxygen Flow Ratio on the Optoelectronic Properties of p-Type Ni1-xO Films Deposited by Ion Beam Assisted Sputtering

Hui Sun    
Sheng-Chi Chen    
Wen-Chi Peng    
Chao-Kuang Wen    
Xin Wang and Tung-Han Chuang    

Resumen

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