Redirigiendo al acceso original de articulo en 17 segundos...
Inicio  /  Applied Sciences  /  Vol: 11 Par: 24 (2021)  /  Artículo
ARTÍCULO
TITULO

Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications

Hongsub Jee    
Kiseok Jeon    
Min-Joon Park and Jaehyeong Lee    

Resumen

Nanoporous structures have attracted great attention in electronics, sensor and storage devices, and photonics because of their large surface area, large volume to surface ratio, and potential for high-sensitivity sensor applications. Normally, electron or ion beam patterning can be used for nanopores fabrication by direct writing. However, direct writing is a rather expensive and time-consuming method due to its serial nature. Therefore, it may not translate to a preferred manufacturing process. In this research, a perfectly ordered large-area periodic pattern in an area of approximately 1 cm2 has been successfully fabricated on various substrates including glass, silicon, and polydimethylsiloxane, using a two-step process comprising visible light-based multibeam interference lithography and subsequent pattern transfer processes of reactive ion etching and nanomolding. Additionally, the multibeam interference lithography templated anodized aluminum oxide process has been described. Since the fabrication area in multibeam interference lithography can be extended by using a larger beam size, it is highly cost effective and manufacturable. Furthermore, although not described here, an electrodeposition process can be utilized as a pattern transfer process. This large-area perfectly ordered nanopore array will be very useful for high-density electronic memory and photonic bandgap and metamaterial applications.

 Artículos similares

       
 
Yuan Li, Ye Ding, Bai Cheng, Junjie Cao and Lijun Yang    
Monocrystalline silicon has shown great potential in constructing advanced devices in semiconductor, photoelectric, and photochemistry fields. The fabrication of micro-grooves with large depth-to-width ratio (DTWR) and low taper is in urgent demand as th... ver más
Revista: Applied Sciences

 
Sarosh Ahmad, Umer Ijaz, Salman Naseer, Adnan Ghaffar, Muhammad Awais Qasim, Faisal Abrar, Naser Ojaroudi Parchin, Chan Hwang See and Raed Abd-Alhameed    
A type of telecommunication technology called an ultra-wideband (UWB) is used to provide a typical solution for short-range wireless communication due to large bandwidth and low power consumption in transmission and reception. Printed monopole antennas a... ver más
Revista: Applied Sciences

 
Zhiqiang Han, Sookhyun Jeong, Jae-Won Jang, Jong Hun Woo and Daekyun Oh    
Glass fiber-reinforced polymer (GFRP) ship structures have hull plate thicknesses of 10 mm or more and are fabricated using a higher proportion of resin matrix systems than E-glass fiber reinforcements. Therefore, GFRP is classified as a highly attenuati... ver más
Revista: Applied Sciences

 
Keke Song, Xiaoping Zou, Huiyin Zhang, Chunqian Zhang, Jin Cheng, Baoyu Liu, Yujun Yao, Xiaolan Wang, Xiaotong Li, Yifei Wang and Baokai Ren    
The electron transport layer (ETL) is critical to carrier extraction for perovskite solar cells (PSCs). Moreover, the morphology and surface condition of the ETL could influence the topography of the perovskite layer. ZnO, TiO2, and SnO2 were widely inve... ver más
Revista: Coatings

 
Dae-Seop Byeon, Choonghee Cho, Dongmin Yoon, Yongjoon Choi, Kiseok Lee, Seunghyun Baik and Dae-Hong Ko    
Conventional Si or SiGe epitaxy via chemical vapor deposition is performed at high temperatures with a large amount of hydrogen gas using silane (SiH4) or dichlorosilane (SiCl2H2) precursors. These conventional precursors show low growth rates at low tem... ver más
Revista: Coatings