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Pasika Temeeprasertkij, Michio Iwaoka and Satoru Iwamori
On the basis of the decolorization caused by the reaction of active oxygen species (AOSs) with methylene blue (MB), our group recently developed colorimetric indicators for hydroxyl radical (OH radical) by embedding MB in polymer thin films made of water...
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Po-Chou Chen, Shu-Mei Chang, Hao-Chung Kuo, Fu-Cheng Chang, Yu-An Li and Chao-Cheng Ting
In this research, a 14 nm high-performance computing application-specific integrated circuit was coated with a 5?20 nm Al2O3 thin film by atomic layer deposition in room-temperature conditions to study its performance in terms of reliability with differe...
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Stefano Mauro Martinuzzi, Lorenzo Donati, Walter Giurlani, Federico Pizzetti, Emanuele Galvanetto, Nicola Calisi, Massimo Innocenti and Stefano Caporali
Chromium deposits rank among the most widespread metal coatings for functional and decorative purposes. However, electrodeposition from Cr(VI) aqueous solution, which is the industrial process currently used to achieve thin chromium deposits, presents se...
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Roberto Baca-Arroyo
Analog computing from recycling principle for next circular economy scenario has been studied with an iron oxide-coupled graphite/Fe?Si steel structure which was built using recycled waste materials, such as lead pencil and 3% Si steel (Fe?Si steel) foil...
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Jeongwoo Park, Neung Kyung Yu, Donghak Jang, Eunae Jung, Hyunsik Noh, Jiwon Moon, Deoksin Kil and Bonggeun Shong
Various processes based on atomic layer deposition (ALD) have been reported for growing Ti-based thin films such as TiN and TiO2. To improve the uniformity and conformity of thin films grown via ALD, fundamental understanding of the precursor?substrate s...
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